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Product Details
ITEM O₂ + Ar (ppm) N₂ (ppm) CD₄ (ppm) CO (ppm) CO₂ (ppm) H₂O + D₂O (ppm) Acceptance criteria ≤1 ≤10 ≤2 ≤1 ≤1 ≤2 -
Common product information
Common product information Gas Name Chemical Formula Purity Main Process Application Features / Remarks Hydrogen chloride (HCl) HCL 5N Etching process Wafer surface contaminant removal Chlorine Cl₂ 5N Metal etching (Al, W, etc.) Strong etching capability Fluorine F₂ 5N High-speed metal etching Highly toxic and explosive NF₃ NF₃ 4N CVD chamber cleaning process Generation of F after plasma dissociation
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Isotope
ND3 (Deuterated ammonia)
- Spectroscopy experiments (NMR, Raman, IR, etc.)** → Due to the mass difference of deuterium, spectral features change, making these techniques advantageous for studying molecular dynamics.
- Neutron scattering experiments** → Deuterium has a different neutron scattering length, which makes it useful for contrast variation and comparative experiments.
- Plasma physics and nuclear fusion experiments** → Deuterium (D) is used as a fusion fuel, and ND₃ is introduced in certain plasma experiments.
- Quantum mechanics and vibrational mode analysis** → Differences in vibrational frequencies between NH₃ and ND₃ are exploited in quantum chemistry research.
- purity 99.998%
- CAS 13550-89-7
- package 8L / CGA720
