-
Common product information
Gas name Chemical formula Purity Key process Features/Remarks Hydrogen chloride (HCl) HCL 5N Etching process Wafer surface contaminant removal Chlorine Cl₂ 5N Metal etching (Al, W, etc.) Strong etching capability Fluorine F₂ 5N High-speed metal etching Highly toxic and explosive NF₃ NF₃ 4N CVD chamber cleaning process Generation of F after plasma dissociation
안녕하세요 서브2의 문구입니다.
Special Gases
FRD is a specialized manufacturer of specialty gases serving

